Atomic layer deposition at Tampere University: boosting supercapacitor performance
At Tampere University (TAU), cutting-edge nanotechnology is at the heart of our contribution to the ARMS project. Using Atomic Layer Deposition (ALD), we decorate supercapacitor electrodes at the nanometer scale. This precise technique enhances the energy density of the final supercapacitor, pushing the boundaries of energy storage technology.
Recently, our team captured a moment in the lab featuring Hamed (a post-doctoral researcher) and Remuel (a doctoral researcher) working with the glove box. A glove box is a sealed container designed to allow researchers to handle sensitive materials in a controlled atmosphere, free from contaminants like moisture or oxygen. Inside this glove box, the ALD chamber is located, providing a controlled environment for the deposition process. In the photo, Hamed and Remuel are carefully placing the electrodes into the ALD chamber, ensuring the highest level of precision for the nanometer-scale electrode decoration.
The dedication and teamwork behind this innovative research highlight TAU’s vital role in advancing the ARMS project. Stay tuned for more updates as we continue exploring new frontiers in energy storage with flexible and structural supercapacitors!